Toyohashi University of Technology

Planned Services (To Be Made Available Upon Completion of Operational Setup)

Design

  • Design for Integration of CMOS Integrated Circuits and High Value-Added Functions (Sensors, Photonics, etc.)
  • Design and analysis of impurity profiles and operating potentials (TCAD, Spectra)

Prototype

  • Prototype Fabrication of Integrated Circuits (up to 4-inch wafers; gate lengths: 1.5 μm and 5 μm)
    CMOS integrated circuits
    CMOS/JFET hybrid integrated circuits
    Integrated devices combining ICs with MEMS/sensors and functional materials
    Potential-detection type multimodal sensor arrays (light, ions, pressure, etc.)
  • Prototype Device Fabrication
    GaN, GaN/Si devices (μLEDs, μLED arrays)
    Optoelectronic devices using compound semiconductors (LEDs, solar cells)
    Optical waveguides (Si, SiGe processing)
    MEMS, microfluidic, and μTAS devices
  • Packaging (Wafer dicing and bonding)
  • Educational Programs
    Training courses on integrated circuit technology for professionals and students?(From n-MOS IC process to evaluation: 5-day program)

Evaluation

  • Wafer Process Evaluation
    Thin film thickness measurement, step height measurement, CD (critical dimension) measurement, and observation
  • Electrical characterization and evaluation of MOSFETs and CMOS integrated circuits

Provided Services (Provided in future)

Design

  • Design Feedback from Prototype Devices
    Extraction of device parameters from prototypes and feedback into design (within FY2026)

Prototype

  • Fine Processing for 8-inch Wafers
    Support for 8-inch wafer microfabrication (within FY2026)

Evaluation

  • Wafer Process Evaluation for 8-inch Wafers
    Thin film thickness measurement, step height measurement, CD measurement, and observation (within FY2026)
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  • 【Last updated】2025/07/15
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