【公開日：2025.06.10】【最終更新日：2025.05.26】

課題データ / Project Data

課題番号 / Project Issue Number

24UT1162

利用課題名 / Title

Micro Surface Patterning　マイクロ表面テクスチャリング

利用した実施機関 / Support Institute

東京大学 / Tokyo Univ.

機関外・機関内の利用 / External or Internal Use

外部利用/External Use

技術領域 / Technology Area

【横断技術領域 / Cross-Technology Area】（主 / Main）加工・デバイスプロセス/Nanofabrication（副 / Sub）計測・分析/Advanced Characterization

【重要技術領域 / Important Technology Area】（主 / Main）次世代ナノスケールマテリアル/Next-generation nanoscale materials（副 / Sub）-

キーワード / Keywords

DLC, ,光学顕微鏡/ Optical microscope,原子層薄膜/ Atomic layer thin film,スパッタリング/ Sputtering,膜加工・エッチング/ Film processing/etching

利用者と利用形態 / User and Support Type

利用者名（課題申請者）/ User Name (Project Applicant)

崔 埈豪

所属名 / Affiliation

東京都市大学理工学部 機械工学科

共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes

ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes

利用形態 / Support Type

（主 / Main）機器利用/Equipment Utilization（副 / Sub）,機器利用/Equipment Utilization

利用した主な設備 / Equipment Used in This Project

UT-703：8インチ汎用スパッタ装置
UT-603：汎用高品位ICPエッチング装置
UT-850：形状・膜厚・電気特性評価装置群

報告書データ / Report

概要（目的・用途・実施内容）/ Abstract (Aim, Use Applications and Contents)

The fabrication of micro-patterns on Diamond-Like Carbon (DLC) films offers diverse industrial applications, many of which remain unexplored. This study aims to investigate the feasibility of using photolithographic technology to create various patterns.

実験 / Experimental

PBII&D (Plasma Based Ion Implantation and Deposition) equipment was used to deposit aC:H thin film together with SiC_x:H interlayer above the nitride surfaces. Then, aluminum metallic layer with thickness of 0.4 μm was deposited using ULVAC SIH-450 equipment on the surface of the aC:H film. Thereafter, ULVAC NE-550 etching equipment was employed to remove the unmasked area of the photo-resist coating which is accomplished by the following two steps. First, Cl₂ and BCl₃ gases were used to etch the Al layer. Then, O₂ gas was utilized to etch the top 2.4 μm thickness of the aC:H amorphous film. The fabricated devices were observed by the optical microscop. 

結果と考察 / Results and Discussion

After producing micro-patterns in sizes ranging from 3×3 to 10×10 microns, it was observed that the 3×3, 4×4, and 5×5 patterns exhibited distortion compared to the larger ones. We believe that the surface roughness of the DLC top layer plays a significant role in affecting pattern resolution. To mitigate this issue, we are considering depositing a thin metallic layer on the DLC film.

図・表・数式 / Figures, Tables and Equations

その他・特記事項（参考文献・謝辞等） / Remarks(References and Acknowledgements)

成果発表・成果利用 / Publication and Patents

論文・プロシーディング（DOIのあるもの） / DOI (Publication and Proceedings)

口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.

特許 / Patents

特許出願件数 / Number of Patent Applications：0件
特許登録件数 / Number of Registered Patents：0件