利用報告書 / User's Reports

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【公開日:2025.06.10】【最終更新日:2025.04.24】

課題データ / Project Data

課題番号 / Project Issue Number

24NM5378

利用課題名 / Title

FIB sample of graphen on Nikel

利用した実施機関 / Support Institute

物質・材料研究機構 / NIMS

機関外・機関内の利用 / External or Internal Use

内部利用(ARIM事業参画者以外)/Internal Use (by non ARIM members)

技術領域 / Technology Area

【横断技術領域 / Cross-Technology Area】(主 / Main)計測・分析/Advanced Characterization(副 / Sub)-

【重要技術領域 / Important Technology Area】(主 / Main)マテリアルの高度循環のための技術/Advanced materials recycling technologies(副 / Sub)-

キーワード / Keywords

CVD,スピントロニクス/Spintronics,カーボン系材料/Carbon related materials,電子顕微鏡/ Electronic microscope


利用者と利用形態 / User and Support Type

利用者名(課題申請者)/ User Name (Project Applicant)

PHAN DINH THANG

所属名 / Affiliation

物質・材料研究機構

共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes

矢治光一郎

ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes
利用形態 / Support Type

(主 / Main)技術代行/Technology Substitution(副 / Sub),技術代行/Technology Substitution


利用した主な設備 / Equipment Used in This Project

NM-517:FIB/SEM精密微細加工装置(Helios 650)
NM-503:200kV電界放出形透過電子顕微鏡(JEM-2100F1)
NM-513:ピックアップシステム
NM-516:TEM試料作製装置群


報告書データ / Report

概要(目的・用途・実施内容)/ Abstract (Aim, Use Applications and Contents)

Due to the proximity effect, the spin-splitting of graphene on ferromagnetic Ni(111) material has attracted scientists' attention, causing them to study it intensively for spintronics applications. In this case, the electronic structure of graphene is believed to change notably. A chemical vapor deposition of graphene on Ni(111) (CVD G/Ni(111)) substrate is a high-potential system for developing graphene-based devices. Transmission electron microscopy (TEM) is one of the most powerful techniques for getting insight into the structure of semiconductor materials. A 100 nm cross-section sample of CVD G/Ni(111) will be made using the focused ion beam (FIB) technique. The original CVD G/Ni(111) sample is coated using platinum (Pt) materials to protect the graphene during the cutting and thinning procedures.

実験 / Experimental

To investigate the quality of a CVD G/Ni(111) system, we aim to make a focused ion beam (FIB) sample of G/Ni(111).

結果と考察 / Results and Discussion

A focused ion beam sample was successfully extracted from the original graphene on Ni(111) (G/Ni(111)) substrate. The FIB sample is thinned into 100 nm of thickness using an ion beam (at 30 kV, 8 kV). The TEM images show the cross-section of the G/Ni(111) structure. The number of graphene is reflected via the number of wrinkles between the Ni(111) substrate and the Pt-coating regions. As a result, we found that our chemical vapor deposition G/Ni(111) consists of one or two to multiple graphene layers (maximum around 20 layers). In the multilayer graphene region, we observe a clear number of wrinkles. However, in the one- or two-layer graphene the wrinkle is unclear. The expected thickness of one- or two-layer graphene region is usually thicker than the general (0.34 nm). One of the main reasons is the strong ion beam's power during the FIB sample's thinning that destroys the structure of the one- or two-layer graphene.

図・表・数式 / Figures, Tables and Equations
その他・特記事項(参考文献・謝辞等) / Remarks(References and Acknowledgements)


成果発表・成果利用 / Publication and Patents

論文・プロシーディング(DOIのあるもの) / DOI (Publication and Proceedings)
口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.
特許 / Patents

特許出願件数 / Number of Patent Applications:0件
特許登録件数 / Number of Registered Patents:0件

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