利用報告書 / User's Reports

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【公開日:2025.06.10】【最終更新日:2025.03.24】

課題データ / Project Data

課題番号 / Project Issue Number

24UT1038

利用課題名 / Title

Quantum-dot chiral lasers via bound state in the continuum for interferometric chirality sensing

利用した実施機関 / Support Institute

東京大学 / Tokyo Univ.

機関外・機関内の利用 / External or Internal Use

内部利用(ARIM事業参画者以外)/Internal Use (by non ARIM members)

技術領域 / Technology Area

【横断技術領域 / Cross-Technology Area】(主 / Main)加工・デバイスプロセス/Nanofabrication(副 / Sub)計測・分析/Advanced Characterization

【重要技術領域 / Important Technology Area】(主 / Main)高度なデバイス機能の発現を可能とするマテリアル/Materials allowing high-level device functions to be performed(副 / Sub)-

キーワード / Keywords

円偏光、メタサーフェス,光学顕微鏡/ Optical microscope,電子線リソグラフィ/ EB lithography,フォトニクスデバイス/ Nanophotonics device,膜加工・エッチング/ Film processing/etching


利用者と利用形態 / User and Support Type

利用者名(課題申請者)/ User Name (Project Applicant)

ドロネー ジャンジャック

所属名 / Affiliation

東京大学工学系研究科機械工学専攻

共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes

DI XING ,MU-HSIN CHEN,YING-TSUNG LEE

ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes
利用形態 / Support Type

(主 / Main)機器利用/Equipment Utilization(副 / Sub)-


利用した主な設備 / Equipment Used in This Project

UT-503:超高速大面積電子線描画装置
UT-600:汎用ICPエッチング装置


報告書データ / Report

概要(目的・用途・実施内容)/ Abstract (Aim, Use Applications and Contents)

Circularly polarized light (CPL) sources are critical for applications in communication, chiral sensing, displays, and quantum computation. However, achieving narrow-linewidth coherent chiral emission with high directionality and significant degrees of polarization (DOP) remains a challenge. Chiral metasurfaces leveraging optical bound states in the continuum (BICs) offer a promising solution by enhancing chirality and coherence. Nevertheless, the complexity of metasurface design and stringent fabrication requirements limit their practical application.

実験 / Experimental

This work demonstrates coherent chiral lasers utilizing optical bound states in the continuum (BICs). A nanonotch is introduced to the square lattice to break the symmetry of the nanocylinder array as shown in Fig.1. The experimental session includes: 1. Patterning of dielectric nanocylinder array with electron-beam lithography (F7000S-VD02) 2. Dry etching of TiO2 nanocylinder array by ICP-RIE (CE-300I) . Etching recipe: 30 sccm CHF3, 1.33 Pa pressure, 30 W bias power, and 500 W RF power.

結果と考察 / Results and Discussion

The fabricated BIC chiral laser is demonstrated as shown in Fig.2 and Fig3. By introducing a nano notch to the square lattice, the symmetry of the nano lattice is broken, therefore achieving a narrow linewidth and highly directional chiral lasing.

図・表・数式 / Figures, Tables and Equations


Fig1 The tilted SEM image of the fabricated TiO2 nanorod array.



Fig.2 The far field image of the laser at the back focal plane.



Fig.3 The circular dichroism mapping of the laser at the back focal plane.


その他・特記事項(参考文献・謝辞等) / Remarks(References and Acknowledgements)


成果発表・成果利用 / Publication and Patents

論文・プロシーディング(DOIのあるもの) / DOI (Publication and Proceedings)
口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.
特許 / Patents

特許出願件数 / Number of Patent Applications:0件
特許登録件数 / Number of Registered Patents:0件

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