【公開日：2025.04.16】【最終更新日：2025.01.27】
課題データ / Project Data
課題番号 / Project Issue Number
23UT1077
利用課題名 / Title
Solution-Processed Perovskite Quantum Dot Quasi-BIC Laser from Miniaturized Low-Lateral-Loss Cavity
利用した実施機関 / Support Institute
東京大学 / Tokyo Univ.
機関外・機関内の利用 / External or Internal Use
内部利用（ARIM事業参画者以外）/Internal Use (by non ARIM members)
技術領域 / Technology Area
【横断技術領域 / Cross-Technology Area】（主 / Main）加工・デバイスプロセス/Nanofabrication（副 / Sub）-
【重要技術領域 / Important Technology Area】（主 / Main）高度なデバイス機能の発現を可能とするマテリアル/Materials allowing high-level device functions to be performed（副 / Sub）量子・電子制御により革新的な機能を発現するマテリアル/Materials using quantum and electronic control to perform innovative functions
キーワード / Keywords
フォトニクスデバイス/ Nanophotonics device,リソグラフィ/ Lithography,電子線リソグラフィ/ EB lithography,膜加工・エッチング/ Film processing/etching,光リソグラフィ/ Photolithgraphy,量子効果/ Quantum effect
利用者と利用形態 / User and Support Type
利用者名（課題申請者）/ User Name (Project Applicant)
ドロネー ジャンジャック
所属名 / Affiliation
東京大学大学院工学系研究科機械工学専攻
共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes
Mu-Hsin Chen,Zhiyu Wang,Bo-Wei Lin,Jean-Jacques Delaunay
ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes
利用形態 / Support Type
（主 / Main）機器利用/Equipment Utilization（副 / Sub）-
利用した主な設備 / Equipment Used in This Project
UT-505：レーザー直接描画装置 DWL66+2018
UT-503：超高速大面積電子線描画装置
UT-600：汎用ICPエッチング装置
報告書データ / Report
概要（目的・用途・実施内容）/ Abstract (Aim, Use Applications and Contents)
Laser devices produced via solution-processed perovskite quantum dots (QDs) offer broad spectral tunability as well as ease of fabrication, which makes them highly appealing for numerous applications, including integrated photonic circuitry, displays, communications, sensing, and biomedical fields. Utilizing quasi-BIC(Bound state in the continuum) modes, solution-processed QD laser devices have been demonstrated with a nanostructure coated in a thin-film gain media configuration. However, light leakage through thin-film guiding from the cavity side edges becomes more pronounced when shrinking the cavity size, posing challenges for the miniaturization of quasi-BIC-based lasers. The reason to postpone the release of user report: To publish the paper.
実験 / Experimental
This work demonstrates quantum dot BIC laser from a miniaturized low-lateral-loss cavity. The fabrication of well-defined patterns of QDs via a solution process allows us to take advantage of the pattern edges to reduce losses through the cavity edges as well as the strong light confinement with in the nanocylinder array. The experimental session includes:1. Patterning of dielectric nanocylinder array with electron-beam lithography (F7000s), 2. Dry etching of TiO2 nanocylinder array by ICP-RIE (CE-300I), 3. Alignment patterning of QD cavity by laser lithography (DWL 66+).
結果と考察 / Results and Discussion
The fabricated QD cavity-supported BIC laser is demonstrated. By integrating an isolated CsPbBr3 QD cavity on a TiO2 nanocylinder array. A small footprint single mode BIC laser with a narrow linewidth of around 0.1 nm is realized.
図・表・数式 / Figures, Tables and Equations
Fig.1 The tilted-SEM image of the fabricated TiO2 nanocylinder array.
Fig.2 The top-view SEM image of the fabricated QD cavity on TiO2 nanocylinder array.
Fig.3 The high-resolution spectrum of the single-mode lasing showing an FWHM of around 0.1 nm.
その他・特記事項（参考文献・謝辞等） / Remarks(References and Acknowledgements)
成果発表・成果利用 / Publication and Patents
論文・プロシーディング（DOIのあるもの） / DOI (Publication and Proceedings)
口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.
特許 / Patents
特許出願件数 / Number of Patent Applications：0件
特許登録件数 / Number of Registered Patents：0件