Toyohashi University of Technology (To Be Made Available Upon Completion of Operational Setup)
- TH-101 Wet bench(DALTON DF-1)
- TH-102 Wet bench(Clesen)
- TH-103 Wet bench(DALTON ECS-1)
- TH-151 Mask Fabrication System
- TH-152 Spin Dryer
- TH-153 Supercritical Cleaning and Drying System
- TH-201 Metal Deposition System(L-420S)
- TH-202 Metal Deposition System(E-400S)
- TH-203 Metal Deposition System (E-401S)
- TH-204 Metal Deposition System (Noyes)
- TH-205 Metal Deposition System(SANVAC)
- TH-206 Oxide Deposition System(E-401S)
- TH-207 Dielectric Deposition System
- TH-208 Prylene Deposition System
- TH-251 LPCVD system
- TH-252 Plasma Enhanced CVD system(for CMOS)
- TH-253 Plasma Enhanced CVD system(TEOS)
- TH-254 Plasma Enhanced CVD system(Cetus)
- TH-301 Dry etching system(CMOS F)
- TH-302 Dry etching system(CMOS Cl)
- TH-303 Dry etching system(F)
- TH-304 Dry etching system(Cl)
- TH-305 Dry etching system(Sirius)
- TH-306 Dry etching system(Deep-RIE)
- TH-307 Dry etching system(CE-300I)
- TH-308 Dry etching system(GaN)
- TH-309 XeF2 etching system
- TH-310 Ashing System
- TH-371 UV/O3 Treatment System
- TH-401 Oxidation/Thermal Processing System
- TH-402 Oxidation/Thermal Processing System(General purpose)
- TH-403 Thermal Processing System
- TH-404 Thermal Processing System
- TH-461 Ion Implantation System
- TH-462 Phosphorus Diffusion System
- TH-501 i-line lithography system
- TH-511 Contact lithography system(for 2inch)
- TH-512 Contact lithography system(for 4inch)
- TH-513 Double-Sided Aligner
- TH-514 Maskless lithography system
- TH-561 Coater and Developer system
- TH-562 Coater and Developer system
- TH-601 Stealth dicing system
- TH-602 Blade dicing system
- TH-631 Bondimg system
- TH-632 Bondimg system
- TH-701 Electron Microscopy System
- TH-702 Focused Ion Beam (FIB) System
- TH-721 Confocal Microscope
- TH-722 Microscope(LV150)
- TH-723 Microscope(VHX-8000)
- TH-724 Flatness Tester
- TH-801 Optical Interferometer
- TH-802 Surface Step Profiler
- TH-803 Ellipsometer
- TH-841 Four-Point Probe Measurement System
- TH-842 Semiconductor Electrical Characterization System(Semi-Automatic)
- TH-843 Semiconductor Electrical Characterization System(Variable Temperature)
- TH-844 Semiconductor Electrical Characterization System(Manual Probing)
The University of Osaka