Institute of Science Tokyo (Former Tokyo Institute of Technology)
- IT-040 Surface-activated Room-temperature Bonding
- IT-041 Ion-beam milling system
- IT-042 Electron Beam Lithograpy
- IT-043 Electron Beam Evaporator
- IT-044 Laser lithography
The University of Osaka
Hiroshima University
- RO-419 Reactive ion etching system for SiO2
- RO-420 ICP etching system for Si
- RO-325 6-target Sputtering system
- RO-332 Atomic Layer Deposition
- RO-516 Semiconductor Parameter Analyzer
- RO-517 Mixed Signal Oscillosope