Date
9:00-17:00 Tuesday, March 3, 2026
Place
Building E, Toyota Technological Institute
Host
ARIM at Toyota Technological Institute
Capacity
3 person with pre-registration
Participation fee
Industry 40,000 yen/person, Academic 25,000 yen/person
Application for participation
[Registration form] https://forms.gle/NkMEFjJjFseSSDHV6
Summary
A training and seminar course for making photomask and mask patterning is prepared.
You will learn the basics of photolithography. One is the maskless exposure and another is the fine pattern transfer using the mask.
The contents also include the under-etching of chromium for making the mask.
※For details, please see the event information.
Contact
Toyota Technological Institute ARIM Office
E-mail: arim_office(at)toyota-ti.ac.jp ※Please replace (at) with @.
Please refer to the link below for further details.
[URL] https://www.toyota-ti.ac.jp/event/stydy/002860.html
