日時
2025年12月15日(月)9:00-19:30
場所
主催
東北大学マイクロシステム融合研究開発センター(μSIC)
共催
Fraunhofer Institute for Electronic Nano Systems (ENAS)
定員
100名
参加費
無料
参加申し込み
Fraunhofer ENASのwebサイトより参加登録(英語)
Webフォーム https://www.enas.fraunhofer.de/en/news_events/Events/fraunhofer-symposia/registration-fraunhofer-symposium.html
申込締切:12月8日(月)24:00
※事前登録制
詳細
9:00-9:20 Greetings / Opening remarks
Fraunhofer, Tohoku University, SiIicon Saxony
9:20-10:20 Keynotes
・Prof. Shuji Tanaka (Tohoku University)
MEMS Technology beyond MEMS
・Ines Stolberg (Vistec Electron Beam GmbH)
Variable Shaped E-Beam Lithography - The Swiss Army Knife of Advanced Nanopatterning!
10:20-10:45 Break+Exhibition
10:45-12:05 Session 1: Sensors and Integration
・Prof. Masanori Muroyama (Tohoku Institute of Technology)
Versatile Applications of Sensor Platform LSIs: From MEMS-Based Robotic Tactile Networks to Human Motion Sensing in a Super-Aging Society
・Dr. Manuela Junghähnel (Fraunhofer IZM-ASSID)
Fluidic cooling for modular interposer architecture providing scalable heat removal, power delivery, and communication
・Prof. Takehito Shimatsu (Tohoku University)
Recent advances in atomic diffusion bonding: room temperature bonding of wafers using inorganic thin films
・Franz Tank (Fraunhofer ENAS)
Optomechanical Inertial Sensors Based on Ring Resonators: Design Approaches and Technology
12:05-12:35 Business matching pitches
Companies/Institutes from Japan and Germany
12:35-13:35 Lunch break, exhibition and business matchmaking
13:35-14:55 Session 2: Digital twin, AI and testing
・Dr. Jan Langer,Fraunhofer ENAS)
Knowledge-Enhanced Process Modeling in CMP: A Case Study in Semiconductor Fabrication
・Mr. Hiroyuki Saito (AIZOTH Inc.)
Integrating Process Workflows in Semiconductors: Linking Process Models via Multi-Sigma® AI Chain Analysis
・Dr. Alexander Weiβ (Fraunhofer ENAS)
European Test and Reliability Center Chemnitz (ETRC): A unique ecosystem for chip industry
14:55-15:20 Break and exhibition
15:20-17:00 Session 3: Photonics and optical sensing
・Dr. Ryoichiro Suzuki(Ricoh Co., Ltd.)
Recent progress of VCSEL technology at RICOH: from Printing to 3D sensing
・Mr. Yasuhiro Fujimura (OPTOWL Co., Ltd.)
Recent Advances and Future Prospects of OPTOWL Microdevices: From Here, Greater Light
・Prof. Thoralf Gebel (HZDR Helmholtz Center Dresden)
Ion implantation technologies for applications in Quantum Photonics and Optoelectronics
・Prof. Kentaro Iwami (Tokyo University of Agriculture and Technology)
Dielectric Metasurfaces for Next-Generation Optical Devices and Systems
17:00-17:30 Business matchmaking
Companies/Institutes from Japan and Germany
17:30-19:30 Dinner reception
お問い合わせ
マイクロシステム融合研究開発センター 大高 剛一
E-mail: koichi.ohtaka.e8(at)tohoku.ac.jp ※(at)を@に書き換えてください。
Tel: 022-229-4113
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[URL] https://www.mu-sic.tohoku.ac.jp/?p=680
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